Materials for microlithography: radiation-sensitive polymers edited by L. F. Thompson, C. G. Willson and J. M. J. Frechet
Material type: TextSeries: ACS symposium series; no.266Publication details: Washington American Chemical Society c1984Description: viii,494p.:ill.; 22cm.-DDC classification:- 547.84 THO
Item type | Current library | Collection | Call number | Status | Date due | Barcode | Item holds |
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Books | North Eastern Hill University | PHSC | 547.84 THO (Browse shelf(Opens below)) | Available | 101247 |
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