Materials for microlithography: radiation-sensitive polymers (Record no. 41823)

MARC details
000 -LEADER
fixed length control field 00465nam a2200133 4500
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 547.84
Item number THO
245 ## - TITLE STATEMENT
Title Materials for microlithography: radiation-sensitive polymers
Statement of responsibility, etc. edited by L. F. Thompson, C. G. Willson and J. M. J. Frechet
260 ## - PUBLICATION, DISTRIBUTION, ETC.
Place of publication, distribution, etc. Washington
Name of publisher, distributor, etc. American Chemical Society
Date of publication, distribution, etc. c1984
300 ## - PHYSICAL DESCRIPTION
Extent viii,494p.:ill.; 22cm.-
490 ## - SERIES STATEMENT
Series statement ACS symposium series; no.266
710 ## - ADDED ENTRY--CORPORATE NAME
Corporate name or jurisdiction name as entry element Thompson, L. F.
710 ## - ADDED ENTRY--CORPORATE NAME
Corporate name or jurisdiction name as entry element Willson, C. G.
710 ## - ADDED ENTRY--CORPORATE NAME
Corporate name or jurisdiction name as entry element Frechet, J. M. J.
Holdings
Withdrawn status Lost status Damaged status Not for loan Collection code Home library Current library Date acquired Total Checkouts Full call number Barcode Date last seen Price effective from Koha item type
          North Eastern Hill University North Eastern Hill University 24/11/2011   547.84 THO 101247 24/11/2011 24/11/2011 Books