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Materials for microlithography: radiation-sensitive polymers

Materials for microlithography: radiation-sensitive polymers edited by L. F. Thompson, C. G. Willson and J. M. J. Frechet - Washington American Chemical Society c1984 - viii,494p.:ill.; 22cm.- - ACS symposium series; no.266 .

Dewey Class. No.: 547.84 / THO

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