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Materials for microlithography: radiation-sensitive polymers edited by L. F. Thompson, C. G. Willson and J. M. J. Frechet

Contributor(s): Material type: TextTextSeries: ACS symposium series; no.266Publication details: Washington American Chemical Society c1984Description: viii,494p.:ill.; 22cm.-DDC classification:
  • 547.84 THO
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Holdings
Item type Current library Collection Call number Status Date due Barcode Item holds
Books Books North Eastern Hill University PHSC 547.84 THO (Browse shelf(Opens below)) Available 101247
Total holds: 0

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