| 000 | 00465nam a2200133 4500 | ||
|---|---|---|---|
| 245 |
_aMaterials for microlithography: radiation-sensitive polymers _cedited by L. F. Thompson, C. G. Willson and J. M. J. Frechet |
||
| 710 | _aThompson, L. F. | ||
| 710 | _aWillson, C. G. | ||
| 710 | _aFrechet, J. M. J. | ||
| 260 |
_aWashington _bAmerican Chemical Society _cc1984 |
||
| 300 | _aviii,494p.:ill.; 22cm.- | ||
| 490 | _aACS symposium series; no.266 | ||
| 082 |
_a547.84 _bTHO |
||
| 999 |
_c41823 _d41823 |
||