Materials for microlithography: radiation-sensitive polymers edited by L. F. Thompson, C. G. Willson and J. M. J. Frechet

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TextSeries: ACS symposium series; no.266Publication details: Washington American Chemical Society c1984Description: viii,494p.:ill.; 22cm.-DDC classification:

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Item type	Current library	Collection	Call number	Status	Date due	Barcode	Item holds
Books	North Eastern Hill University	PHSC	547.84 THO (Browse shelf(Opens below))	Available		101247

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